Invention Grant
- Patent Title: Thin film transistor substrate and method of manufacturing the same
- Patent Title (中): 薄膜晶体管基板及其制造方法
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Application No.: US14081160Application Date: 2013-11-15
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Publication No.: US09236455B2Publication Date: 2016-01-12
- Inventor: Jung-Yun Jo , Sung-Hoon Yang , Ki-Seong Seo , Jin-Ho Hwang
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2013-0080743 20130710
- Main IPC: H01L29/00
- IPC: H01L29/00 ; H01L29/66 ; H01L29/786

Abstract:
A thin film transistor substrate includes an active pattern which is disposed on a base substrate and includes a channel, a source electrode and a drain electrode, the channel which includes an oxide semiconductor, the source electrode and the drain electrode connected the channel, a gate electrode overlapped with the channel, a passivation layer which covers the source electrode, the drain electrode and the gate electrode and a fluorine deposition layer disposed between the active pattern and the passivation layer.
Public/Granted literature
- US20150014677A1 THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2015-01-15
Information query
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