发明授权
- 专利标题： Control exposure
- 专利标题（中）： 控制曝光
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申请号： US13410888申请日： 2012-03-02
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公开(公告)号： US09250713B2公开(公告)日： 2016-02-02
- 发明人: Brian J. Ewanchuk , Lawrence W. Olson , Michael J. Hillberg , Akhilesh Kaza , Jeremy B. Gup , Austin M. Lamb
- 申请人： Brian J. Ewanchuk , Lawrence W. Olson , Michael J. Hillberg , Akhilesh Kaza , Jeremy B. Gup , Austin M. Lamb
- 申请人地址： US WA Redmond
- 专利权人： Microsoft Technology Licensing, LLC
- 当前专利权人： Microsoft Technology Licensing, LLC
- 当前专利权人地址： US WA Redmond
- 代理商 Aaron Chatterjee; Raghu Chinagudabha; Micky Minhas
- 主分类号： G06F3/00
- IPC分类号： G06F3/00 ; G06F9/44 ; G06F9/46 ; G06F13/00 ; G06F3/03 ; G06F3/01
摘要：
Control exposure techniques are described. In one or more implementations, a determination is made by a computing device as to which of a plurality of controls correspond to one or more inputs detected using one or more magnetometers, cameras, or microphones. A result of the determination is exposed by the computing device to one or more applications that are executed by the computing device.
公开/授权文献
- US20130145380A1 CONTROL EXPOSURE 公开/授权日：2013-06-06
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