Invention Grant
US09257257B2 Electron beam control method, electron beam generating apparatus, apparatus using the same, and emitter
有权
电子束控制方法,电子束发生装置,使用该装置的装置和发射极
- Patent Title: Electron beam control method, electron beam generating apparatus, apparatus using the same, and emitter
- Patent Title (中): 电子束控制方法,电子束发生装置,使用该装置的装置和发射极
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Application No.: US12306635Application Date: 2006-06-30
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Publication No.: US09257257B2Publication Date: 2016-02-09
- Inventor: Shin Fujita , Mohamed El-Gomati , Torquil Wells
- Applicant: Shin Fujita , Mohamed El-Gomati , Torquil Wells
- Applicant Address: JP Kyoto GB York
- Assignee: SHIMADZU CORPORATION,UNIVERSITY OF YORK HESLINGTON
- Current Assignee: SHIMADZU CORPORATION,UNIVERSITY OF YORK HESLINGTON
- Current Assignee Address: JP Kyoto GB York
- Agency: McDermott Will & Emery LLP
- International Application: PCT/GB2006/050180 WO 20060630
- International Announcement: WO2008/001030 WO 20080103
- Main IPC: G01N23/00
- IPC: G01N23/00 ; H01J37/065 ; H01J35/06

Abstract:
Provided is a Schottky emitter having the conical end with a radius of curvature of 2.0 μm on the emission side of an electron beam. Since a radius of curvature is 1 μm or more, a focal length of an electron gun can be longer than in a conventional practice wherein a radius of curvature is in the range of from 0.5 μm to not more than 0.6 μm. The focal length was found to be roughly proportional to the radius of the curvature. Since the angular current intensity (the beam current per unit solid angle) is proportional to square of the electron gun focal length, the former can be improved by an order of magnitude within a practicable increase in the emitter radius. A higher angular current intensity means a larger beam current available from the electron gun and the invention enables the Schottky emitters to be used in applications which require relatively high beam current of microampere regime such as microfocus X-ray tube, electron probe micro-analyzer, and electron beam lithography system.
Public/Granted literature
- US20100127170A1 ELECTRON BEAM CONTROL METHOD, ELECTRON BEAM GENERATING APPARATUS, APPARATUS USING THE SAME, AND EMITTER Public/Granted day:2010-05-27
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