发明授权
US09257257B2 Electron beam control method, electron beam generating apparatus, apparatus using the same, and emitter
有权
电子束控制方法,电子束发生装置,使用该装置的装置和发射极
- 专利标题: Electron beam control method, electron beam generating apparatus, apparatus using the same, and emitter
- 专利标题(中): 电子束控制方法,电子束发生装置,使用该装置的装置和发射极
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申请号: US12306635申请日: 2006-06-30
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公开(公告)号: US09257257B2公开(公告)日: 2016-02-09
- 发明人: Shin Fujita , Mohamed El-Gomati , Torquil Wells
- 申请人: Shin Fujita , Mohamed El-Gomati , Torquil Wells
- 申请人地址: JP Kyoto GB York
- 专利权人: SHIMADZU CORPORATION,UNIVERSITY OF YORK HESLINGTON
- 当前专利权人: SHIMADZU CORPORATION,UNIVERSITY OF YORK HESLINGTON
- 当前专利权人地址: JP Kyoto GB York
- 代理机构: McDermott Will & Emery LLP
- 国际申请: PCT/GB2006/050180 WO 20060630
- 国际公布: WO2008/001030 WO 20080103
- 主分类号: G01N23/00
- IPC分类号: G01N23/00 ; H01J37/065 ; H01J35/06
摘要:
Provided is a Schottky emitter having the conical end with a radius of curvature of 2.0 μm on the emission side of an electron beam. Since a radius of curvature is 1 μm or more, a focal length of an electron gun can be longer than in a conventional practice wherein a radius of curvature is in the range of from 0.5 μm to not more than 0.6 μm. The focal length was found to be roughly proportional to the radius of the curvature. Since the angular current intensity (the beam current per unit solid angle) is proportional to square of the electron gun focal length, the former can be improved by an order of magnitude within a practicable increase in the emitter radius. A higher angular current intensity means a larger beam current available from the electron gun and the invention enables the Schottky emitters to be used in applications which require relatively high beam current of microampere regime such as microfocus X-ray tube, electron probe micro-analyzer, and electron beam lithography system.
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