Invention Grant
US09257260B2 Method and system for adaptively scanning a sample during electron beam inspection
有权
电子束检测过程中自适应扫描样品的方法和系统
- Patent Title: Method and system for adaptively scanning a sample during electron beam inspection
- Patent Title (中): 电子束检测过程中自适应扫描样品的方法和系统
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Application No.: US14260053Application Date: 2014-04-23
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Publication No.: US09257260B2Publication Date: 2016-02-09
- Inventor: Gary Fan , David Chen , Vivekanand Kini , Hong Xiao
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: H01J37/28
- IPC: H01J37/28 ; H01J37/21 ; G01N23/225 ; H01J37/147

Abstract:
A system for adaptive electron beam scanning may include an inspection sub-system configured to scan an electron beam across the surface of a sample. The inspection sub-system may include an electron beam source, a sample stage, a set of electron-optic elements, a detector assembly and a controller communicatively coupled to one or more portions of the inspection sub-system. The controller may assess one or more characteristics of one or more portions of an area of the sample for inspection and, responsive to the assessed one or more characteristics, adjust one or more scan parameters of the inspection sub-system.
Public/Granted literature
- US20140319342A1 Method and System for Adaptively Scanning a Sample During Electron Beam Inspection Public/Granted day:2014-10-30
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