发明授权
- 专利标题： Extended runway centerline systems and methods
- 专利标题（中）： 延长跑道中线系统和方法
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申请号： US13857955申请日： 2013-04-05
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公开(公告)号： US09262932B1公开(公告)日： 2016-02-16
- 发明人: Sarah Barber , Christopher A. Scherer , Travis S. VanDerKamp , Victor E. VIllagomez
- 申请人： Sarah Barber , Christopher A. Scherer , Travis S. VanDerKamp , Victor E. VIllagomez
- 申请人地址： US IA Cedar Rapids
- 专利权人： Rockwell Collins, Inc.
- 当前专利权人： Rockwell Collins, Inc.
- 当前专利权人地址： US IA Cedar Rapids
- 代理商 Angel N. Gerdzhikov; Donna P. Suchy; Daniel M. Barbieri
- 主分类号： G08G5/02
- IPC分类号： G08G5/02
摘要：
Extended runway systems and methods include generating a runway centerline that extends from a start point on the runway to an endpoint located at a predefined distance from the start point. One or more distance markers are also calculated for the runway centerline. Display data is provided to an electronic display that causes the display to show the runway centerline and the one or more distance markers.
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