Invention Grant
- Patent Title: Thin film transistor and manufacturing method thereof
- Patent Title (中): 薄膜晶体管及其制造方法
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Application No.: US14558937Application Date: 2014-12-03
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Publication No.: US09263590B2Publication Date: 2016-02-16
- Inventor: Jung-Kyu Lee , Do-Hyun Kwon , Min-Jung Lee , Sung-Eun Lee , Moo-Soon Ko
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2013-0149726 20131204
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L29/66 ; H01L29/10

Abstract:
A thin film transistor (TFT) includes a semiconductor active layer, a gate electrode, a source electrode, and a drain electrode. The semiconductor active layer includes a first doped region as a source region, a second doped region as a drain region, an undoped region between the first and second doped regions. A third doped region is disposed between the second doped region and the undoped region. The gate electrode is insulated from the semiconductor active layer and overlaps the third doped region and the undoped region. The source electrode and the drain electrode are connected to the first and second doped regions.
Public/Granted literature
- US20150155391A1 THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF Public/Granted day:2015-06-04
Information query
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