Invention Grant
- Patent Title: Resistive memory device having asymmetric diode structure
- Patent Title (中): 具有不对称二极管结构的电阻式存储器件
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Application No.: US14609452Application Date: 2015-01-30
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Publication No.: US09263673B2Publication Date: 2016-02-16
- Inventor: Masayuki Terai , In-Gyu Baek
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Volentine & Whitt, PLLC
- Priority: KR10-2014-0076772 20140623
- Main IPC: H01L45/00
- IPC: H01L45/00

Abstract:
A resistive memory device includes a switching device disposed on a lower interconnection, a resistor element disposed on the switching device, and an upper interconnection disposed on the resistor element. The switching device includes a diode electrode, a high-concentration lower anode disposed on the diode electrode, a middle-concentration lower anode disposed on the lower high-concentration anode electrode, a common cathode disposed on the middle-concentration lower anode, a low-concentration upper anode disposed on the common cathode, and an high-concentration upper anode disposed on the low-concentration upper anode. The peak dopant concentration of the middle-concentration lower anode is at least 10 times greater than the peak dopant concentration of the low-concentration upper anode.
Public/Granted literature
- US20150372229A1 RESISTIVE MEMORY DEVICE HAVING ASYMMETRIC DIODE STRUCTURE Public/Granted day:2015-12-24
Information query
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