Invention Grant
- Patent Title: Arc evaporation source having fast film-forming speed, coating film manufacturing method and film formation apparatus using the arc evaporation source
- Patent Title (中): 电弧蒸发源具有快速的成膜速度，涂膜制造方法和使用电弧蒸发源的成膜装置
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Application No.: US13805259Application Date: 2011-06-15
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Publication No.: US09266180B2Publication Date: 2016-02-23
- Inventor: Shinichi Tanifuji , Kenji Yamamoto , Homare Nomura , Yoshinori Kurokawa , Naoyuki Goto
- Applicant: Shinichi Tanifuji , Kenji Yamamoto , Homare Nomura , Yoshinori Kurokawa , Naoyuki Goto
- Applicant Address: JP Hyogo
- Assignee: Kobe Steel, Ltd.
- Current Assignee: Kobe Steel, Ltd.
- Current Assignee Address: JP Hyogo
- Agency: Studebaker & Brackett PC
- Priority: JP2010-142614 20100623; JP2010-201946 20100909
- International Application: PCT/JP2011/003403 WO 20110615
- International Announcement: WO2011/161903 WO 20111229
- Main IPC: B23K9/00
- IPC: B23K9/00 ; C23C14/32 ; H01J37/32 ; H01J37/34
Abstract:
An arc evaporation source having fast film-forming speed includes: at least one circumference magnet surrounding the circumference of a target, wherein the magnetization direction of the magnet runs orthogonal to the target surface; a non-ring shaped first permanent magnet on the target's rear surface side has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the target's surface; a non-ring shaped second permanent magnet arranged either on the rear surface side of the first permanent magnet or between the first permanent magnet and the target, so as to leave a gap from the first permanent magnet, has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the surface of the target; and a magnetic body between the first permanent magnet and the second permanent magnet.
Public/Granted literature
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