Invention Grant
- Patent Title: Field effect transistor
- Patent Title (中): 场效应晶体管
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Application No.: US14133064Application Date: 2013-12-18
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Publication No.: US09269813B2Publication Date: 2016-02-23
- Inventor: Soohun Hong , Heesoo Kang , Dongho Cha
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR10-2013-0000276 20130102
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/66 ; H01L29/165

Abstract:
Field effect transistors are provided. An active region protrudes from a substrate and a gate electrode is provided on the active region. Source/drain regions are provided at both sides of the active region under the gate electrode, respectively. A width of a lower portion of the gate electrode is greater than a width of an upper portion of the gate electrode.
Public/Granted literature
- US20140183599A1 Field Effect Transistor Public/Granted day:2014-07-03
Information query
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