Invention Grant
- Patent Title: Methods for forming defect-free anodized parts
- Patent Title (中): 无缺陷阳极氧化部件的形成方法
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Application No.: US14585021Application Date: 2014-12-29
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Publication No.: US09279189B2Publication Date: 2016-03-08
- Inventor: Lucy Elizabeth Browning , Masashige Tatebe , Shi Hua Zhang , Michael W. Barnstead , Richard M. Bretherton , Takahiro Oshima , Sean A. Backs , Duy P. Le , Andrew J. Meschke , Thomas Johannessen
- Applicant: Apple Inc.
- Applicant Address: US CA Cupertino
- Assignee: Apple Inc.
- Current Assignee: Apple Inc.
- Current Assignee Address: US CA Cupertino
- Agency: Downey Brand LLP
- Main IPC: C25D5/02
- IPC: C25D5/02 ; H05K5/04

Abstract:
Manufacturing methods related to anodizing of metal parts are described. In particular, pre-anodizing and post-anodizing methods for forming a consistent and defect-free interface between metal and non-metal sections of a part are described. Methods involve preventing residues from various manufacturing processes from entering a gap or space at the interface between the metal and non-metal section of the part and that can disrupt subsequent anodizing and anodic film dyeing processes. In particular embodiments, methods involve forming a barrier layer or filler layer between the metal and non-metal sections. Portions of the barrier layer or filler layer can be removed prior to anodizing. The resultant part has a well-defined and uniform space between the metal and non-metal sections that is free from visual defects.
Public/Granted literature
- US20150315715A1 METHODS FOR FORMING DEFECT-FREE ANODIZED PARTS Public/Granted day:2015-11-05
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