Invention Grant
- Patent Title: Dynamically tracking spectrum features for endpoint detection
- Patent Title (中): 动态跟踪用于端点检测的频谱特征
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Application No.: US14331534Application Date: 2014-07-15
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Publication No.: US09283653B2Publication Date: 2016-03-15
- Inventor: Jeffrey Drue David , Harry Q. Lee
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: B24B49/12
- IPC: B24B49/12 ; B24B37/013 ; B24B37/20
Abstract:
A method of controlling polishing includes polishing a substrate and receiving an identification of a selected spectral feature, a wavelength range having a width, and a characteristic of the selected spectral feature to monitor during polishing. A sequence of spectra of light from the substrate is measured while the substrate is being polished. A sequence of values of the characteristic of the selected spectral feature is generated from the sequence of spectra. For at least some spectra from the sequence of spectra, a modified wavelength range is generated based on a position of the spectral feature within a previous wavelength range used for a previous spectrum in the sequence of spectra, the modified wavelength range is searched for the selected spectral feature, and a value of a characteristic of the selected spectral feature is determined.
Public/Granted literature
- US20140329440A1 Dynamically Tracking Spectrum Features For Endpoint Detection Public/Granted day:2014-11-06
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