Invention Grant
- Patent Title: Schottky barrier diode and method of manufacturing the same
- Patent Title (中): 肖特基势垒二极管及其制造方法
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Application No.: US14468987Application Date: 2014-08-26
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Publication No.: US09287415B2Publication Date: 2016-03-15
- Inventor: Dae Hwan Chun , Kyoung-Kook Hong , Jong Seok Lee , Junghee Park , Youngkyun Jung
- Applicant: Hyundai Motor Company
- Applicant Address: KR Seoul
- Assignee: Hyundai Motor Company
- Current Assignee: Hyundai Motor Company
- Current Assignee Address: KR Seoul
- Agency: Mntz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Priority: KR10-2013-0167807 20131230
- Main IPC: H01L51/40
- IPC: H01L51/40 ; H01L29/872 ; H01L21/04 ; H01L29/66 ; H01L29/06 ; H01L29/16

Abstract:
A Schottky barrier diode includes: an n− type epitaxial layer disposed on a first surface of an n+ type silicon carbide substrate; a first p+ region disposed on the n− type epitaxial layer; an n type epitaxial layer disposed on the n− type epitaxial layer and the first p+ region; a second p+ region disposed on the n type epitaxial layer, and being in contact with the first p+ region; a Schottky electrode disposed on the n type epitaxial layer and the second p+ region; and an ohmic electrode disposed on a second surface of the n+ type silicon carbide substrate. Also, the first p+ region has a lattice shape including a plurality of vertical portions and horizontal portions connecting both ends of the respective vertical portions to each other.
Public/Granted literature
- US20150187962A1 SCHOTTKY BARRIER DIODE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2015-07-02
Information query
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