Invention Grant
- Patent Title: Calibratable beam shaping system and method
- Patent Title (中): 可校准光束整形系统及方法
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Application No.: US13849187Application Date: 2013-03-22
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Publication No.: US09291825B2Publication Date: 2016-03-22
- Inventor: Binyamin Kirshner , Haim Eder
- Applicant: Applied Materials Israel, Ltd.
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel, Ltd.
- Current Assignee: Applied Materials Israel, Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: G06K7/10
- IPC: G06K7/10 ; G02B27/09 ; G01J1/42 ; G02B7/00

Abstract:
A beam shaping system including: a first and second optical modules that are accommodated in a spaced-apart relationship in an optical path of light through the system to sequentially apply beam shaping to light incident thereon. The beam shaping system includes first and second alignment modules respectively carrying the first and second optical modules and operable for laterally positioning the optical modules with respect to the optical path. A calibration module of the beam shaping system is connectable to the first and second alignment modules and is operable to sequentially calibrate and align the respective lateral positions of the first and second optical modules with respect to the optical path. The system thereby enables shaping of an incoming light beam of given predetermined wave-front and lateral intensity distribution to form an output light beam having desired wave-front and desired lateral intensity distribution.
Public/Granted literature
- US20140285877A1 CALIBRATABLE BEAM SHAPING SYSTEM AND METHOD Public/Granted day:2014-09-25
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