发明授权
- 专利标题: Electron gun and charged particle beam device having an aperture with flare-suppressing coating
- 专利标题(中): 具有带阻燃涂层的孔的电子枪和带电粒子束装置
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申请号: US14240333申请日: 2012-05-22
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公开(公告)号: US09293293B2公开(公告)日: 2016-03-22
- 发明人: Shun-ichi Watanabe , Takashi Onishi , Yoichi Ose , Kuniyasu Nakamura , Masaru Moriyama , Tomonori Suzuki
- 申请人: Shun-ichi Watanabe , Takashi Onishi , Yoichi Ose , Kuniyasu Nakamura , Masaru Moriyama , Tomonori Suzuki
- 申请人地址: JP Tokyo
- 专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2011-180851 20110822
- 国际申请: PCT/JP2012/063017 WO 20120522
- 国际公布: WO2013/027448 WO 20130228
- 主分类号: A61N5/00
- IPC分类号: A61N5/00 ; H01J37/065
摘要:
The objective of the present application is to suppress the occurrence of flares and to reduce the amount of secondary electrons arising at an aperture provided to the lead-out electrode of an electron gun. By coating a thin film having a low rate of secondary electron emission such as carbon onto the aperture of a lead-out electrode closest to an electron source in an electron gun, it is possible to reduce the amount of secondary electrons arising. Secondary electrons arising at the lead-out electrode, are reduced, and so as a result, flare is reduced. By incorporating two apertures to the lead-out electrode, and applying to the two apertures a potential that is equipotential to the lead-out electrode, it is possible to eliminate an electric field from seeping from under to over the lead-out electrode. Secondary electrons arising when an electron beam impacts the lead-out electrode cease to incur force in the direction of passage from the lead-out electrode, and consequently there is a reduction in flares.
公开/授权文献
- US20140197336A1 ELECTRON GUN AND CHARGED PARTICLE BEAM DEVICE 公开/授权日:2014-07-17
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