Invention Grant
US09293359B2 Non-volatile memory cells with enhanced channel region effective width, and method of making same
有权
具有增强的通道区域有效宽度的非易失性存储单元及其制造方法
- Patent Title: Non-volatile memory cells with enhanced channel region effective width, and method of making same
- Patent Title (中): 具有增强的通道区域有效宽度的非易失性存储单元及其制造方法
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Application No.: US14191625Application Date: 2014-02-27
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Publication No.: US09293359B2Publication Date: 2016-03-22
- Inventor: Nhan Do , Hieu Van Tran , Chien-Sheng Su , Prateep Tuntasood
- Applicant: Silicon Storage Technology, Inc.
- Applicant Address: US CA San Jose
- Assignee: Silicon Storage Technology, Inc.
- Current Assignee: Silicon Storage Technology, Inc.
- Current Assignee Address: US CA San Jose
- Agency: DLA Piper LLP (US)
- Main IPC: H01L29/788
- IPC: H01L29/788 ; H01L21/762 ; H01L29/66 ; H01L27/115 ; H01L21/28 ; H01L29/423

Abstract:
A memory device array with spaced apart parallel isolation regions formed in a semiconductor substrate, with an active region between each pair of adjacent isolation regions. Each isolation region includes a trench formed into the substrate surface and an insulation material formed in the trench. Portions of a top surface of the insulation material are recessed below the surface of the substrate. Each active region includes a column of memory cells each having spaced apart first and second regions with a channel region therebetween, a floating gate over a first channel region portion, and a select gate over a second channel region portion. The select gates are formed as continuous word lines extending perpendicular to the isolation regions and each forming the select gates for one row of the memory cells. Portions of each word line extend down into the trenches and disposed laterally adjacent to sidewalls of the trenches.
Public/Granted literature
- US20140264539A1 Non-volatile Memory Cells With Enhanced Channel Region Effective Width, And Method Of Making Same Public/Granted day:2014-09-18
Information query
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