Invention Grant
- Patent Title: Mask plate, exposure method thereof and liquid crystal display panel including the same
- Patent Title (中): 掩模板,曝光方法和包括其的液晶显示面板
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Application No.: US14241820Application Date: 2014-01-21
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Publication No.: US09298082B2Publication Date: 2016-03-29
- Inventor: Meng Li , Jinjie Wang
- Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Shenzhen
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Shenzhen
- Agency: Stein IP, LLC
- Priority: CN201310728529 20131225
- International Application: PCT/CN2014/071013 WO 20140121
- International Announcement: WO2015/096249 WO 20150702
- Main IPC: G03F1/38
- IPC: G03F1/38 ; G02F1/1335 ; G02F1/1368 ; G03F7/00 ; G02F1/1343

Abstract:
The present disclosure relates to a mask plate, an exposure method thereof, and a liquid crystal display panel including the mask plate. On the mask plate, a plurality of pattern regions is arranged in a gradient variation from the center of the mask plate to the edges thereof according to the deformation degree of the exposure mask. The method for exposing the mask plate comprises the following steps of, (a) providing an exposure mask in a horizontal state, and measuring the deformation degree of the exposure mask; (b) arranging, on the mask plate, a plurality of pattern regions, the dimensions of which change in a gradient manner from the center of the mask plate to the edges thereof according to the deformation degree of the exposure mask; and (c) completing the exposure of the mask plate. The mask plate according to the present disclosure can compensate the effect of deformation of the exposure mask on the exposure area of the mask plate.
Public/Granted literature
- US20150177610A1 MASK PLATE, EXPOSURE METHOD THEREOF AND LIQUID CRYSTAL DISPLAY PANEL INCLUDING THE SAME Public/Granted day:2015-06-25
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