Invention Grant
- Patent Title: Substrate holder, lithographic apparatus, and device manufacturing method
- Patent Title (中): 基板支架，光刻设备和器件制造方法
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Application No.: US14563792Application Date: 2014-12-08
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Publication No.: US09298104B2Publication Date: 2016-03-29
- Inventor: Siegfried Alexander Tromp , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/66 ; H01L21/683 ; H01L21/67
Abstract:
A substrate holder for use in a lithographic apparatus. The substrate holder comprises a main body, a plurality of burls and a heater and/or a temperature sensor. The main body has a surface. The plurality of burls project from the surface and have end surfaces to support a substrate. The heater and/or temperature sensor is provided on the main body surface. The substrate holder is configured such that when a substrate is supported on the end surfaces, a thermal conductance between the heater and/or temperature sensor and the substrate is greater than a thermal conductance between the heater and/or temperature sensor and the main body surface.
Public/Granted literature
- US20150092168A1 SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2015-04-02
Information query
IPC分类:
