A transistor, planar or non-planar (e.g., FinFET), includes T-shaped contacts to the source, drain and gate. The top portion of the T-shaped contact is wider than the bottom portion, the bottom portion complying with design rule limits. A conductor-material filled trench through a multi-layer etching stack above the transistor provides the top portions of the T-shaped contacts. Tapered spacers along inner sidewalls of the top contact portion prior to filling allow for etching a narrower bottom trench down to the gate, and to the source/drain for silicidation prior to filling.