发明授权
- 专利标题： Ophthalmic apparatus, and treatment site measuring method for the apparatus
- 专利标题（中）： 眼科仪器和设备的治疗部位测量方法
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申请号： US14414700申请日： 2013-07-15
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公开(公告)号： US09301681B2公开(公告)日： 2016-04-05
- 发明人: Tae Ho Ha , Ki Chan Kim
- 申请人： LUTRONIC CORPORATION
- 申请人地址： KR Goyang
- 专利权人： LUTRONIC CORPORATION
- 当前专利权人： LUTRONIC CORPORATION
- 当前专利权人地址： KR Goyang
- 优先权： KR10-2012-0076782 20120713
- 国际申请： PCT/KR2013/006326 WO 20130715
- 国际公布： WO2014/011014 WO 20140116
- 主分类号： A61B3/10
- IPC分类号： A61B3/10 ; A61B3/12 ; A61B3/00 ; A61B3/14 ; G06T7/00
摘要：
The present invention relates to an ophthalmic apparatus and to a treatment site measuring method for the apparatus. The ophthalmic apparatus according to the present invention comprises: a first image unit for capturing the lower region of a retina so as to generate an image of the captured retina; a second image unit for capturing the local region of the retina indicated by a surgical operator so as to generate an image of the captured local region of the retina; and a control unit for mapping the image of the local region of the retina generated by the second image unit to the image of the retina generated by the first image unit based on the image of the retina generated by the first image unit.
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