Invention Grant
US09305907B2 Optoelectronic integrated device including a photodetector and a MOSFET transistor, and manufacturing process thereof
有权
包括光电检测器和MOSFET晶体管的光电集成器件及其制造方法
- Patent Title: Optoelectronic integrated device including a photodetector and a MOSFET transistor, and manufacturing process thereof
- Patent Title (中): 包括光电检测器和MOSFET晶体管的光电集成器件及其制造方法
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Application No.: US14206328Application Date: 2014-03-12
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Publication No.: US09305907B2Publication Date: 2016-04-05
- Inventor: Luigi Arcuri , MariaEloisa Castagna
- Applicant: STMicroelectronics S.r.l.
- Applicant Address: IT Agrate Brianza (MB)
- Assignee: STMICROELECTRONICS S.R.L.
- Current Assignee: STMICROELECTRONICS S.R.L.
- Current Assignee Address: IT Agrate Brianza (MB)
- Agency: Allen, Dyer, Doppelt, Milbrath & Gilchrist, P.A.
- Priority: ITTO2013A0236 20130322
- Main IPC: H01L25/16
- IPC: H01L25/16 ; H01L27/06 ; H01L27/07 ; H01L27/146 ; H03K17/785 ; H01L27/144 ; H01L29/78

Abstract:
An optoelectronic integrated device includes a body made of semiconductor material, which is delimited by a front surface and includes a substrate having a first type of conductivity, an epitaxial region, which has the first type of conductivity and forms the front surface, and a ring region having a second type of conductivity, which extends into the epitaxial region from the front surface, and delimiting an internal region. The optoelectronic integrated device moreover includes a MOSFET including at least one body region having the second type of conductivity, which contacts the ring region and extends at least in part into the internal region from the front surface. A photodetector includes a photodetector region having the second type of conductivity, and extends into the semiconductor body starting from the front surface, contacting the ring region.
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