Invention Grant
- Patent Title: Thin film deposition source, deposition apparatus and deposition method using the same
- Patent Title (中): 薄膜沉积源，沉积装置和使用其的沉积方法
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Application No.: US14037244Application Date: 2013-09-25
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Publication No.: US09309588B2Publication Date: 2016-04-12
- Inventor: Jong Woo Lee
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: KR10-2012-0139082 20121203
- Main IPC: C23C16/52
- IPC: C23C16/52 ; C23C14/04 ; C23C14/54
Abstract:
A thin film deposition source, a deposition apparatus and a deposition method using the same are disclosed. The deposition apparatus includes a deposition source including a plurality of jet nozzles that spray a deposition substance on a surface of a substrate and are arranged in a first direction, and at least one shutter controlling a jet region of the deposition substance by opening or shielding at least a portion of a jetting passageway of the deposition substance.
Public/Granted literature
- US20140154403A1 THIN FILM DEPOSITION SOURCE, DEPOSITION APPARATUS AND DEPOSITION METHOD USING THE SAME Public/Granted day:2014-06-05
Information query
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