发明授权
US09312160B2 Wafer suction method, wafer suction stage, and wafer suction system
有权
晶圆抽吸法,晶片吸附台和晶片抽吸系统
- 专利标题: Wafer suction method, wafer suction stage, and wafer suction system
- 专利标题(中): 晶圆抽吸法,晶片吸附台和晶片抽吸系统
-
申请号: US13617354申请日: 2012-09-14
-
公开(公告)号: US09312160B2公开(公告)日: 2016-04-12
- 发明人: Hajime Akiyama , Akira Okada , Kinya Yamashita
- 申请人: Hajime Akiyama , Akira Okada , Kinya Yamashita
- 申请人地址: JP Tokyo
- 专利权人: MITSUBISHI ELECTRIC CORPORATION
- 当前专利权人: MITSUBISHI ELECTRIC CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Studebaker & Brackett PC
- 优先权: JP2012-071988 20120327
- 主分类号: B25B11/00
- IPC分类号: B25B11/00 ; H01L21/677 ; H01L21/683 ; H01L21/687
摘要:
A method of attaching a wafer by suction, includes a step of mounting a wafer on a right arm and a left arm of a transfer jig, moving the transfer jig toward a wafer suction stage in such a manner that a facing right arm surface of the right arm slides along and in contact with a first side surface of the wafer suction stage and a facing left arm surface of the left arm slides along and in contact with a second side surface of the wafer suction stage until the wafer comes to lie directly above a mounting surface of the wafer suction stage, mounting the wafer on the mounting surface by moving the transfer jig downward toward the wafer suction stage while maintaining the contacts, and attaching the wafer to the mounting surface by suction.
公开/授权文献
信息查询