Invention Grant
- Patent Title: Light-transmitting metal electrode having hyperfine structure and process for preparation thereof
- Patent Title (中): 具有超精细结构的透光金属电极及其制备方法
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Application No.: US13669793Application Date: 2012-11-06
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Publication No.: US09312407B2Publication Date: 2016-04-12
- Inventor: Eishi Tsutsumi , Akira Fujimoto , Koji Asakawa
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Minato-ku
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-245167 20070921
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01J1/54 ; H01L31/0224 ; G02F1/1343 ; H01L51/52

Abstract:
The present invention provides a metal electrode transparent to light. The metal electrode comprises a transparent substrate and a metal electrode layer composed of a metal part and plural openings. The metal electrode layer continues without breaks, and 90% or more of the metal part continues linearly without breaks by the openings in a straight length of not more than ⅓ of the visible wavelength to use in 380 nm to 780 nm. The openings have an average diameter in the range of not less than 10 nm and not more than ⅓ of the wavelength of incident light, and the pitches between the centers of the openings are not less than the average diameter and not more than ½ of the wavelength of incident light. The metal electrode layer has a thickness in the range of not less than 10 nm and not more than 200 nm.
Public/Granted literature
- US20130057138A1 LIGHT-TRANSMITTING METAL ELECTRODE HAVING HYPERFINE STRUCTURE AND PROCESS FOR PREPARATION THEREOF Public/Granted day:2013-03-07
Information query
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