Invention Grant
- Patent Title: Apparatus and method for coating substrate
- Patent Title (中): 涂敷基材的装置及方法
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Application No.: US13516481Application Date: 2010-12-29
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Publication No.: US09327299B2Publication Date: 2016-05-03
- Inventor: Kai Asikkala
- Applicant: Kai Asikkala
- Applicant Address: FI Vantaa
- Assignee: BENEQ OY
- Current Assignee: BENEQ OY
- Current Assignee Address: FI Vantaa
- Agency: Oliff PLC
- Priority: FI20100005U 20100104
- International Application: PCT/FI2010/051096 WO 20101229
- International Announcement: WO2011/080397 WO 20110707
- Main IPC: B05C5/02
- IPC: B05C5/02 ; B05B17/00 ; B05B1/00 ; B05D1/02 ; B05B7/00 ; B05B13/02 ; B05B7/04 ; B05B15/04 ; B05B7/08 ; B05B7/16

Abstract:
An apparatus and a method for producing a liquid film from one or more liquid precursors onto the surface of a substrate in order to establish a coating, the apparatus being arranged to direct an aerosol flow against the surface of the substrate in a coating chamber. The apparatus includes a homogenizing nozzle for making the aerosol flow homogeneous substantially in the direction of the surface of the substrate prior to passing the flow into the coating chamber.
Public/Granted literature
- US20120258251A1 APPARATUS AND METHOD FOR COATING SUBSTRATE Public/Granted day:2012-10-11
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