Invention Grant
- Patent Title: Vertically-integrated nonvolatile memory devices having laterally-integrated ground select transistors
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Application No.: US14921845Application Date: 2015-10-23
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Publication No.: US09331095B2Publication Date: 2016-05-03
- Inventor: Sunil Shim , Jaehun Jeong , Jaehoon Jang , Kihyun Kim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel & Sibley, P.A.
- Priority: KR10-2009-0010546 20090210; KR10-2010-0083682 20100827
- Main IPC: G11C11/34
- IPC: G11C11/34 ; H01L27/115 ; G11C16/04

Abstract:
Nonvolatile memory devices utilize vertically-stacked strings of nonvolatile memory cells (e.g., NAND-type strings) that can be selectively coupled to common source lines within a substrate. This selective coupling may be provided by lateral ground select transistors having different threshold voltages that account for different lateral spacings between the vertically-stacked strings of nonvolatile memory cells and the common source lines.
Public/Granted literature
- US20160056172A1 VERTICALLY-INTEGRATED NONVOLATILE MEMORY DEVICES HAVING LATERALLY-INTEGRATED GROUND SELECT TRANSISTORS Public/Granted day:2016-02-25
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