Invention Grant
- Patent Title: Sensor and lithographic apparatus
- Patent Title (中): 传感器和光刻设备
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Application No.: US14439481Application Date: 2013-10-09
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Publication No.: US09331117B2Publication Date: 2016-05-03
- Inventor: Stoyan Nihtianov , Haico Victor Kok , Martijn Gerard Dominique Wehrens
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2013/071080 WO 20131009
- International Announcement: WO2014/067754 WO 20140508
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L27/146 ; G03F7/20 ; H01L31/028 ; H01L31/0352 ; H01L31/18

Abstract:
A backside illuminated sensor comprising a supporting substrate, a semiconductor layer which comprises a photodiode comprising a region of n-doped semiconductor provided at a first surface of the semiconductor layer, and a region of p-doped semiconductor, wherein a depletion region is formed between the region of n-doped semiconductor and the region of p-doped semiconductor, and a layer of p-doping protective material provided on a second surface of the semiconductor layer, wherein the first surface of the semiconductor layer is fixed to a surface of the supporting substrate.
Public/Granted literature
- US20150294998A1 Sensor and Lithographic Apparatus Public/Granted day:2015-10-15
Information query
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