Invention Grant
- Patent Title: Tube-shaped sputtering target
- Patent Title (中): 管状溅射靶
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Application No.: US13365365Application Date: 2012-02-03
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Publication No.: US09334564B2Publication Date: 2016-05-10
- Inventor: Christoph Simons , Martin Schlott , Josef Heindel , Christoph Stahr
- Applicant: Christoph Simons , Martin Schlott , Josef Heindel , Christoph Stahr
- Applicant Address: DE Hanau
- Assignee: Heraeus Deutschland GmbH & Co. KG
- Current Assignee: Heraeus Deutschland GmbH & Co. KG
- Current Assignee Address: DE Hanau
- Agency: Panitch Schwarze Belisario & Nadel LLP
- Priority: DE102011012034 20110222
- Main IPC: C23C14/34
- IPC: C23C14/34 ; C22C28/00 ; H01J37/34
Abstract:
A tube-shaped sputtering target is provided having a carrier tube and an indium-based sputtering material arranged on the carrier tube. The sputtering material has a microstructure having a mean grain size of less than 1 mm, measured as the mean diameter of the grains on the sputtering-roughened surface of the sputtering material.
Public/Granted literature
- US20120213917A1 TUBE-SHAPED SPUTTERING TARGET Public/Granted day:2012-08-23
Information query
IPC分类:
