摘要:
The invention relates to a method for incorporating a structure into a surface of a workpiece that is transparent in a certain wavelength range. For this purpose the surface to be structured is brought into contact with a target surface containing a target material by means of a laser beam, the wavelength of which is within the certain wavelength range, energy is introduced at least at one position through the workpiece and into the boundary region of the surface to be structured and the target surface such that target material is deposited at the respective position in and/or on the surface to be structured. For this purpose a pulsed laser beam having a pulse repetition rate of more than 10 kHz is used, which is focused such that the focus is positioned on or under the target surface, wherein the laser beam has a power density in the focus of more than 2000 W/mm2. The invention further relates to a device for introducing a structure into a surface of a workpiece transparent in a certain wavelength range.
摘要翻译:本发明涉及一种在一定波长范围内将结构结合到工件的表面上的透明度的方法。 为此目的,通过激光束将待构造的表面与包含目标材料的目标表面接触,激光束的波长在一定波长范围内,能量至少在通过工件的一个位置被引入, 进入要被构造的表面的边界区域和目标表面,使得目标材料沉积在待构造的表面中和/或表面上的相应位置。 为此,使用具有大于10kHz的脉冲重复率的脉冲激光束,其被聚焦,使得焦点位于目标表面上或下方,其中激光束的焦点的功率密度大于 2000 W / mm2。 本发明还涉及一种用于将结构引入到在一定波长范围内透明的工件的表面中的装置。
摘要:
A tube-shaped sputtering target is provided having a carrier tube and an indium-based sputtering material arranged on the carrier tube. The sputtering material has a microstructure having a mean grain size of less than 1 mm, measured as the mean diameter of the grains on the sputtering-roughened surface of the sputtering material.
摘要:
A sputtering target is provided which ensures the production of unvaryingly homogenous layers of the sputtering material during the lifespan of the sputtering target. The sputtering target includes a mixture of oxides of indium, zinc, and gallium, the mixture containing at least one ternary mixed oxide of indium, zinc, and gallium and at least one amorphous phase. The portion of ternary mixed oxides of indium, zinc, and gallium is at least 50 weight percent, relative to the total weight of the mixture, and the portion of amorphous phase is at least 20 weight percent, relative to the total weight of the mixture.
摘要:
The invention relates to a method for incorporating a structure (M) into a surface (O) of a workpiece (W) that is transparent in a certain wavelength range. For this purpose the surface (O) to be structured is brought into contact with a target surface (3) containing a target material by means of a laser beam (2), the wavelength of which is within the certain wavelength range, energy is introduced at least at one position through the workpiece (W) and into the boundary region (G) of the surface (O) of the surface (O) to be structured and the target surface (3) such that target material is deposited at the respective position in and/or on the surface (O) to be structured. For this purpose a pulsed laser beam (L) having a pulse repetition rate of more than 10 kHz is used, which is focused such that the focus is positioned on or under the target surface, wherein the laser beam has a power density in the focus of more than 2000 W/mm2. The invention further relates to a device (1) for introducing a structure (M) into a surface (O) of a workpiece (W) transparent in a certain wavelength range.
摘要翻译:本发明涉及将结构(M)结合到在一定波长范围内透明的工件(W)的表面(O)中的方法。 为此,要构成的表面(O)通过其波长在一定波长范围内的激光束(2)与包含目标材料的目标表面(3)接触,引入能量 至少在穿过工件(W)的一个位置处,并进入待构造的表面(O)的表面(O)的边界区域(G)和目标表面(3),使得目标材料沉积在相应的 位于和(或)待结构的表面(O)上。 为此,使用具有大于10kHz的脉冲重复频率的脉冲激光束(L),其聚焦使得焦点位于目标表面上或下方,其中激光束具有聚焦中的功率密度 超过2000 W / mm2。 本发明还涉及一种用于将结构(M)引入到在一定波长范围内透明的工件(W)的表面(O)的装置(1)。
摘要:
The invention relates to thermally sprayed Al2O3 layers having a high content of corundum without any property-reducing additives, and to a method for the production of said layers. The invention may be utilized particularly in the field of electrical insulation, as a dielectric, and as protection from wear. According to the invention, the thermally sprayed Al2O3 layers are characterized in that they have a porosity of no more than 19%, and a high content of α-Al2O3 (content of corundum) of at least 72% by volume. The layers have a specific electrical resistance of >1·1012 Ohms·cm, and a purity of >97%. The production according to the invention of said layers is carried out utilizing aqueous or alcoholic suspensions made from pure α-Al2O3, having a grain size of >100 nm by means of a method from the group of thermal spraying.
摘要翻译:本发明涉及具有高含量的刚玉而没有任何降低性能的添加剂的热喷涂Al 2 O 3层以及所述层的制造方法。 本发明可以特别用于电绝缘领域,作为电介质,以及作为防磨损领域。 根据本发明,热喷涂的Al 2 O 3层的特征在于它们具有不大于19%的孔隙率,并且高含量的α-Al 2 O 3(刚玉含量)为至少72体积%。 这些层的比电阻> 1·1012欧姆·厘米,纯度> 97%。 根据本发明的所述层的生产通过利用热喷涂组中的方法利用粒径> 100nm的纯α-Al 2 O 3水溶液或醇悬浮液进行。
摘要:
A sputtering target is provided which ensures the production of unvaryingly homogenous layers of the sputtering material during the lifespan of the sputtering target. The sputtering target includes a mixture of oxides of indium, zinc, and gallium, the mixture containing at least one ternary mixed oxide of indium, zinc, and gallium and at least one amorphous phase. The portion of ternary mixed oxides of indium, zinc, and gallium is at least 50 weight percent, relative to the total weight of the mixture, and the portion of amorphous phase is at least 20 weight percent, relative to the total weight of the mixture.
摘要:
The disclosure provides a method of producing thermally sprayed Al2O3 coatings having a high content of corundum without any property-reducing additives. The coatings may be utilized particularly in the field of electrical insulation, as a dielectric, and as protection from wear. The thermally sprayed Al2O3 coatings have a porosity of no more than 19%, and a high content of α-Al2O3 (content of corundum) of at least 72% by volume. The coatings have a specific electrical resistance of >1·1012 Ohms·cm, and a purity of >97%. The production of said coatings is carried out utilizing aqueous or alcoholic suspensions made from substantially pure α-Al2O3, having a grain size of >100 nm by thermal spraying.
摘要翻译:本公开提供了一种生产具有高含量刚玉的热喷涂Al 2 O 3涂层的方法,而没有任何降低性能的添加剂。 涂层可以特别用于电绝缘领域,作为电介质,以及作为防磨损领域。 热喷涂的Al2O3涂层的孔隙率不超过19%,α-Al2O3含量高(刚玉含量)至少为72%(体积)。 涂层具有> 1·1012欧姆·厘米的比电阻,纯度> 97%。 所述涂层的生产使用通过热喷涂具有> 100nm的粒度的基本上纯的α-Al 2 O 3制成的水性或醇类悬浮液进行。
摘要:
A tube-shaped sputtering target is provided having a carrier tube and an indium-based sputtering material arranged on the carrier tube. The sputtering material has a microstructure having a mean grain size of less than 1 mm, measured as the mean diameter of the grains on the sputtering-roughened surface of the sputtering material.