Invention Grant
US09335540B2 MEMS device with improved via support planarization 有权
具有改进的通孔支撑平面化的MEMS器件

MEMS device with improved via support planarization
Abstract:
A microelectromechanical (MEMS) device has a movable member supported above a substrate on a via support. The member and via support are fabricated integrally from first and second member forming layers. A first member forming layer forms a lower part of the member and supporting structure for the via support. First and second fill layers are deposited and patterned to form a plug that fills an inner cavity opening in the via structure. The plug is planarized to a planar part of the first member forming layer, and a second member forming layer is deposited over the first member forming layer and the planarized plug to form an upper part of the member. The via support may have a cavity filled by BARC layers.
Public/Granted literature
Information query
Patent Agency Ranking
0/0