Invention Grant
US09343152B2 Cell array with a manufacturable select gate for a nonvolatile semiconductor memory device
有权
具有用于非易失性半导体存储器件的可制造选择栅极的电池阵列
- Patent Title: Cell array with a manufacturable select gate for a nonvolatile semiconductor memory device
- Patent Title (中): 具有用于非易失性半导体存储器件的可制造选择栅极的电池阵列
-
Application No.: US14460963Application Date: 2014-08-15
-
Publication No.: US09343152B2Publication Date: 2016-05-17
- Inventor: Hyoung Seub Rhie
- Applicant: Conversant IP Management Inc.
- Applicant Address: CA Ottawa
- Assignee: CONVERSANT INTELLECTUAL PROPERTY MANAGEMENT INC.
- Current Assignee: CONVERSANT INTELLECTUAL PROPERTY MANAGEMENT INC.
- Current Assignee Address: CA Ottawa
- Agent Daniel Hammond
- Main IPC: G11C16/04
- IPC: G11C16/04 ; H01L27/115

Abstract:
A three-dimensional integrated circuit non-volatile memory array includes a memory array with first and second NAND memory cell string stacks having opposite orientations, where each NAND memory cell string includes a plurality of transistors and a source line contact connected in series between a bit line and string extension region which extends from the source line contact and past a first self-aligned SSL gate electrode located on a peripheral end of the NAND memory cell string, and also includes a string select transistor formed with a second self-aligned SSL connected in series between the bit line and the plurality of transistors, where the first and second self-aligned SSL gate electrodes are shared between adjacent NAND memory cell strings having opposite orientations.
Public/Granted literature
- US20150098274A1 Cell Array with a Manufacturable Select Gate for a Nonvolatile Semiconductor Memory Device Public/Granted day:2015-04-09
Information query