Invention Grant
US09343152B2 Cell array with a manufacturable select gate for a nonvolatile semiconductor memory device 有权
具有用于非易失性半导体存储器件的可制造选择栅极的电池阵列

Cell array with a manufacturable select gate for a nonvolatile semiconductor memory device
Abstract:
A three-dimensional integrated circuit non-volatile memory array includes a memory array with first and second NAND memory cell string stacks having opposite orientations, where each NAND memory cell string includes a plurality of transistors and a source line contact connected in series between a bit line and string extension region which extends from the source line contact and past a first self-aligned SSL gate electrode located on a peripheral end of the NAND memory cell string, and also includes a string select transistor formed with a second self-aligned SSL connected in series between the bit line and the plurality of transistors, where the first and second self-aligned SSL gate electrodes are shared between adjacent NAND memory cell strings having opposite orientations.
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