Invention Grant
- Patent Title: Method for manufacturing thin film transistor array substrate
- Patent Title (中): 制造薄膜晶体管阵列基板的方法
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Application No.: US14582274Application Date: 2014-12-24
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Publication No.: US09343483B2Publication Date: 2016-05-17
- Inventor: Min-Cheol Kim , Youn-Gyoung Chang , Kwon-Shik Park , So-Hyung Lee , Ho-Young Jung , Ha-Jin Yoo , Jeong-Suk Yang
- Applicant: LG Display Co., Ltd.
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Morgan, Lewis & Bockius LLP
- Priority: KR10-2013-0165678 20131227
- Main IPC: H01L27/12
- IPC: H01L27/12

Abstract:
A method for manufacturing a thin film transistor (TFT) array substrate having enhanced reliability is disclosed. The method includes forming a multilayer structure including at least one first metal layer and a second metal layer made of copper, forming a first mask layer including a first mask area corresponding to a data line and a second mask area corresponding to an electrode pattern to overlap with an active layer, patterning the multilayer structure, thereby forming the data line constituted by the multilayer structure, patterning the second metal layer, thereby forming the electrode pattern constituted by the at least one first metal layer, forming a second mask layer to expose a portion of the electrode pattern corresponding to a channel area of the active layer, patterning the at least one first metal layer, thereby forming source and drain.
Public/Granted literature
- US20150187809A1 METHOD FOR MANUFACTURING THIN FILM TRANSISTOR ARRAY SUBSTRATE Public/Granted day:2015-07-02
Information query
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