Invention Grant
- Patent Title: Apparatus for monitoring deposition rate, apparatus provided with the same for depositing organic layer, method of monitoring deposition rate, and method of manufacturing organic light emitting display apparatus using the same
- Patent Title (中): 用于监测沉积速率的装置,用于沉积有机层的装置,用于监测沉积速率的方法,以及使用其制造有机发光显示装置的方法
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Application No.: US14079522Application Date: 2013-11-13
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Publication No.: US09347886B2Publication Date: 2016-05-24
- Inventor: Alexander Voronov , Dmitry Maslov , Gyoo-Wan Han
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: Lewis Roca Rothgerber Christie LLP
- Priority: KR10-2013-0072706 20130624
- Main IPC: H01L21/66
- IPC: H01L21/66 ; G01N21/64 ; C23C14/24 ; C23C14/54 ; C23C14/56

Abstract:
An apparatus for monitoring deposition rate, an apparatus including the same, for depositing an organic layer, a method of monitoring deposition rate, and a method of manufacturing an organic light emitting display apparatus using the same, are provided. The deposition rate monitoring apparatus for measuring deposition rate of a deposition material discharged from a deposition source, includes: a light source for irradiating light having a wavelength within a photoexcitation bandwidth of the deposition material; a first optical system for irradiating the light emitted from the light source toward the discharged deposition material; a second optical system for collecting the light emitted from the deposition material; and a first light sensor for detecting the amount of the light which is emitted from the deposition material and collected in the second optical system.
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Information query
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