Invention Grant
- Patent Title: Graphene heterostructure field effect transistors
-
Application No.: US14684586Application Date: 2015-04-13
-
Publication No.: US09362379B2Publication Date: 2016-06-07
- Inventor: Jeong-Sun Moon
- Applicant: HRL LABORATORIES LLC
- Applicant Address: US CA Malibu
- Assignee: HRL Laboratories, LLC
- Current Assignee: HRL Laboratories, LLC
- Current Assignee Address: US CA Malibu
- Agency: Ladas & Parry
- Main IPC: H01L29/16
- IPC: H01L29/16 ; H01L29/786 ; H01L29/66 ; H01L29/778 ; H01L29/165 ; H01L29/06 ; H01L29/10 ; H01L29/167 ; H01L29/51 ; H01L29/45

Abstract:
A field effect transistor includes a substrate, a first graphene (Gr) layer on the substrate, a second graphene (Gr) layer on the substrate, a fluorographene (GrF) layer on the substrate and between the first and second graphene layers, a first ohmic contact on the first graphene layer, a second ohmic contact on the second graphene layer, a gate aligned over the fluorographene layer, and a gate dielectric between the gate and the fluorographene layer and between the gate and the first and second ohmic contacts.
Public/Granted literature
- US20150214324A1 GRAPHENE HETEROSTRUCTURE FIELD EFFECT TRANSISTORS Public/Granted day:2015-07-30
Information query
IPC分类: