Invention Grant
- Patent Title: Transfer film for in-mold molding and method for producing same
- Patent Title (中): 模内成型用转印膜及其制造方法
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Application No.: US14127964Application Date: 2012-06-18
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Publication No.: US09375867B2Publication Date: 2016-06-28
- Inventor: Kenya Ito , Koji Ohguma , Takuro Tanaka , Yuka Takahashi , Aki Kuromatsu , Mikio Yamahiro
- Applicant: Kenya Ito , Koji Ohguma , Takuro Tanaka , Yuka Takahashi , Aki Kuromatsu , Mikio Yamahiro
- Applicant Address: JP Tokyo
- Assignee: JNC CORPORATION
- Current Assignee: JNC CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Jianq Chyun IP Office
- Priority: JP2011-136730 20110620
- International Application: PCT/JP2012/065553 WO 20120618
- International Announcement: WO2012/176742 WO 20121227
- Main IPC: B29C45/14
- IPC: B29C45/14 ; B32B27/16 ; B44C1/17 ; B32B7/06 ; B32B38/00

Abstract:
Provided is a transfer film for in-mold molding which is superior in solvent resistance, heat resistance, durability, blocking resistance, and moldability, and is capable of suppressing the generation of gate flow, and also provided is a method for producing such a film. The film is provided with: a transfer layer (11) which is to be transferred to an in-mold molded body and which is to be cured when irradiated with active energy rays after the transfer; and a film shaped substrate (L0). The transfer layer (11) comprises an IMD layer (L2) laminated on the substrate (L0) and to be arranged on the outermost surface of the molded body after the in-mold molding. The IMD layer (L2) is constituted by a mixture composition containing at least one active-energy curable resin and at least one thermosetting resin.
Public/Granted literature
- US20140113115A1 TRANSFER FILM FOR IN-MOLD MOLDING AND METHOD FOR PRODUCING SAME Public/Granted day:2014-04-24
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