Invention Grant
- Patent Title: Method for measuring reaction rate of reactive mesogen
- Patent Title (中): 反应性介晶反应速率测定方法
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Application No.: US14282917Application Date: 2014-05-20
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Publication No.: US09377410B2Publication Date: 2016-06-28
- Inventor: Ho Lim , Tae-Min Kim
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2013-0167940 20131231
- Main IPC: G01N21/77
- IPC: G01N21/77 ; G01N21/64 ; G01N21/75

Abstract:
A method for measuring a reaction rate of a reactive mesogen and an alignment layer formed thereby, the method including coating an alignment material on a substrate. The alignment material includes a backbone and a reactive mesogen connected to the backbone. The reactive mesogen includes an unsaturated bond. The alignment material is irradiated with ultraviolet light, or is heated, to form the alignment layer. A marking compound, including a thiol group is coated on the alignment layer and reacts with remaining unreacted reactive mesogen, to form a marked mesogen. An amount of the marked mesogen is detected. A reactive ratio is measured by comparing an amount of the reactive mesogen before irradiating or heating with an amount of the marked mesogen.
Public/Granted literature
- US20150185158A1 METHOD FOR MEASURING REACTION RATE OF REACTIVE MESOGEN Public/Granted day:2015-07-02
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