In an example method, a transition metal precursor is selected so its transition metal has a diffusion rate that is slower than a diffusion rate of silicon. An aqueous mixture is formed by dissolving the precursor in an aqueous medium, and adding silicon particles to the medium. The mixture is exposed to a hydroxide, which forms a product including the silicon particles and a transition metal hydroxide precipitate. The product is dried. In an inert or reducing environment, silicon atoms of the silicon particles in the dried product are caused to diffuse out of, and form voids in and/or at a surface of, the particles. At least some silicon atoms react with the transition metal hydroxide in the dried product to form i) a SiOx (0