Invention Grant
- Patent Title: Optical mask
- Patent Title (中): 光学面具
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Application No.: US14668587Application Date: 2015-03-25
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Publication No.: US09385347B2Publication Date: 2016-07-05
- Inventor: Joon Gu Lee , Yeon Hwa Lee , Jin Baek Choi , Young Gil Kwon
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2014-0117017 20140903
- Main IPC: B41M5/40
- IPC: B41M5/40 ; H01L51/56 ; C23C14/04 ; B41M5/48 ; B41M5/42 ; B41M5/46 ; H01L51/00

Abstract:
An optical mask includes a light-to-heat conversion layer with an improved temperature profile. The optical masks may comprise a light-transmitting base substrate; a first reflective pattern layer which is formed on the light-transmitting base substrate comprising a first opening portion transmitting light emitted from under the light-transmitting base substrate and a first reflective portion reflecting the light; a second reflective pattern layer which is formed over the first opening portion comprising a second opening portion overlapping a first area of the first opening portion and a second reflective portion overlapping a second area of the first opening portion; and a light-to-heat conversion pattern layer which is formed on the light-transmitting base substrate, being disposed in the first area of the first opening portion, absorbing at least a part of the light, and converting the light absorbed into heat.
Public/Granted literature
- US20160064698A1 OPTICAL MASK Public/Granted day:2016-03-03
Information query
IPC分类: