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    Optical patterning mask and method of fabricating display device using the same
    3.
    发明授权
    Optical patterning mask and method of fabricating display device using the same 有权
    光学图案掩模和使用其形成显示装置的方法

    公开(公告)号：US09397297B2

    公开(公告)日：2016-07-19

    申请号：US14621937

    申请日：2015-02-13

    申请人： Samsung Display Co., Ltd.

    发明人： Young Gil Kwon

    IPC分类号： B41M5/40 ,  H01L51/00 ,  B41M5/48 ,  B41M5/42

    CPC分类号： H01L51/0013 ,  B41M5/42 ,  B41M5/426 ,  B41M5/48

    摘要： An optical patterning mask, including a base substrate, a reflective layer disposed on the base substrate, the reflective layer including a first opening, a shadow pattern disposed on the base substrate and in the first opening, a thermal insulation layer disposed on the base substrate and covering the reflective layer and the shadow pattern, an absorption layer disposed on the thermal insulation layer, a bank layer disposed on the absorption layer, the bank layer including a second opening overlapping the first opening, a thermal conduction prevention pattern disposed on the absorption layer and overlapping the shadow pattern, and a transfer layer disposed on the absorption layer, the bank layer, and the thermal conduction prevention pattern.

    摘要翻译： 一种光学图案掩模，包括基底基板，设置在基底基板上的反射层，反射层包括第一开口，阴影图案，设置在基底基板上和第一开口中，设置在基底基板上的绝热层 并且覆盖反射层和阴影图案，设置在绝热层上的吸收层，设置在吸收层上的堤层，堤层包括与第一开口重叠的第二开口，布置在吸收层上的导热防止图案 并且重叠阴影图案，以及设置在吸收层，堤层和导热防止图案上的转印层。

    Optical mask
    5.
    发明授权
    Optical mask 有权
    光学面具

    公开(公告)号：US09360748B2

    公开(公告)日：2016-06-07

    申请号：US14716667

    申请日：2015-05-19

    申请人： Samsung Display Co., Ltd.

    发明人： Yeon Hwa Lee ,  Joon Gu Lee ,  Jin Baek Choi

    IPC分类号： B41M5/46 ,  G03F1/54 ,  H01L51/00 ,  B41M5/48

    CPC分类号： G03F1/54 ,  B41M5/46 ,  B41M5/465 ,  B41M5/48 ,  H01L51/0013

    摘要： An optical mask including a transmissive base substrate, a reflective pattern layer, and a photothermal conversion pattern layer. The reflective pattern layer is disposed on the transmissive base substrate. The reflective pattern layer includes reflectors. The photothermal conversion pattern layer is disposed on the transmissive base substrate among the reflectors. The photothermal conversion pattern layer includes first regions with a first light absorptivity and second regions with a second light absorptivity. The second light absorptivity is greater than the first light absorptivity. The first regions are disposed among the second regions.

    摘要翻译： 一种光掩模，包括透射基底，反射图案层和光热转换图案层。 反射图案层设置在透射基底上。 反射图案层包括反射器。 光电转换图案层设置在反射器之间的透射基底基板上。 光热转换图案层包括具有第一光吸收率的第一区域和具有第二光吸收率的第二区域。 第二光吸收率大于第一光吸收率。 第一区域设置在第二区域中。

    Assemblage and Process for thermal dye transfer
    8.
    发明授权
    Assemblage and Process for thermal dye transfer 失效
    热染料转移的组合和工艺

    公开(公告)号：US5866506A

    公开(公告)日：1999-02-02

    申请号：US882507

    申请日：1997-06-25

    申请人： Lee W. Tutt ,  David L. Jeanmaire

    发明人： Lee W. Tutt ,  David L. Jeanmaire

    IPC分类号： B41M5/34 ,  B41M5/48 ,  B41M5/035 ,  B41M5/38

    CPC分类号： B41M5/48 ,  B41M5/345

    摘要： This invention relates to a thermal dye transfer assemblage comprising:I) a dye-donor element comprising a support having thereon a set of sequential repeating dye patches of two subtractive primary color image dyes dispersed in a polymeric binder; andII) a dye-receiving element comprising a support having thereon in order:a) a layer comprising a heat-sensitive, dye-forming precursor of a third, complementary, subtractive primary color image dye dispersed in a polymeric binder, the dye-forming precursor being capable of forming the third, complementary, subtractive primary color image dye at a temperature which is higher than the temperature used to transfer the other two subtractive primary color image dyes; andb) a dye image-receiving layer; the dye-receiving element being in superposed relationship with the dye-donor element so that the dye layer is in contact with the dye image-receiving layer.

    摘要翻译： 本发明涉及一种热染料转移组合物，其包括：I）染料供体元件，其包含其上具有分散在聚合物粘合剂中的两组减色原色图像染料的顺序重复染色剂片的载体; 和II）染料接收元件，其包含其上依次具有的载体：a）包含分散在聚合物粘合剂中的第三种互补的减色原色图像染料的热敏染料形成前体的层， 其形成前体能够在高于用于转移另外两种减色原色图像染料的温度的温度下形成第三互补的减色原色图像染料; 和b）染料影像接收层; 染料接收元件与染料供体元件重叠关系，使得染料层与染料影像接收层接触。

    Heat-sensitive imaging element
    10.
    发明授权
    Heat-sensitive imaging element 失效
    热敏成像元件

    公开(公告)号：US5478695A

    公开(公告)日：1995-12-26

    申请号：US155223

    申请日：1993-11-22

    申请人： Luc Leenders

    发明人： Luc Leenders

    IPC分类号： B41C1/055 ,  B41C1/10 ,  B41M5/24 ,  B41M5/382 ,  B41M5/40 ,  B41M5/42 ,  B41M5/48 ,  B41N1/14 ,  G03F7/00 ,  G03C1/805 ,  G03F7/075 ,  G03F7/11

    CPC分类号： B41M5/48 ,  B41C1/1033 ,  B41M5/38214 ,  B41M5/24 ,  B41M5/42 ,  Y10S430/146

    摘要： Heat-sensitive imaging element comprising a support carrying a binder layer, optionally an intermediate adhesive layer, and and a barrier layer that is ablatable by a laser beam or permeabilizable under the influence of a laser beam, wherein said binder layer contains at least one hydrophobizing agent capable of diffusing under the influence of heat through holes made in said barrier layer or through permeabilized parts of said barrier layer and capable of reacting with the oleophobic surface of a printing plate precursor brought in face-to-face contact with said barrier layer. The present invention also relates to a process for producing a lithographic printing plate, wherein use is made of such heat-sensitive imaging element.

    摘要翻译： 热敏成像元件包括承载粘合剂层，任选地中间粘合剂层的支撑体，以及可在激光束影响下可激发的可透光的阻挡层，其中所述粘合剂层含有至少一种疏水化 能够在热穿过所述阻挡层中形成的孔或通过所述阻挡层的透化部分扩散的能够与与所述阻挡层面对面接触的印刷版前体的疏油表面反应的试剂。 本发明还涉及一种用于制造平版印刷版的方法，其中使用这种热敏成像元件。