Invention Grant
- Patent Title: Rotary magnetron magnet bar and apparatus containing the same for high target utilization
- Patent Title (中): 旋转磁控管磁棒和含有相同目的的高磁导率仪器
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Application No.: US13504366Application Date: 2010-10-26
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Publication No.: US09388490B2Publication Date: 2016-07-12
- Inventor: John E. Madocks , Patrick Lawrence Morse , Phong Ngo
- Applicant: John E. Madocks , Patrick Lawrence Morse , Phong Ngo
- Applicant Address: US AZ Tucson
- Assignee: General Plasma, Inc.
- Current Assignee: General Plasma, Inc.
- Current Assignee Address: US AZ Tucson
- Agency: Dennemeyer & Associates, LLC.
- International Application: PCT/US2010/054111 WO 20101026
- International Announcement: WO2011/056581 WO 20110512
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C23C14/35 ; C23C14/34

Abstract:
An apparatus for coating a substrate is provided that includes a racetrack-shaped plasma source having two straight portions and at least one terminal turnaround portion connecting said straight portions. A tubular target formed of a target material that forms a component of the coating has an end. The target is in proximity to the plasma source for sputtering of the target material. The target is secured to a tubular backing cathode, with both being rotatable about a central axis. A set of magnets are arranged inside the cathode to move an erosion zone aligned with the terminal turnaround toward the end of the target as the target is utilized to deposit the coating on the substrate. Target utilization of up to 87 weight percent the initial target weight is achieved.
Public/Granted literature
- US20120261253A1 ROTARY MAGNETRON MAGNET BAR AND APPARATUS CONTAINING THE SAME FOR HIGH TARGET UTILIZATION Public/Granted day:2012-10-18
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