Invention Grant
- Patent Title: Methods and apparatus for use with extreme ultraviolet light having contamination protection
- Patent Title (中): 用于具有污染防护的极紫外光的方法和设备
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Application No.: US14176587Application Date: 2014-02-10
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Publication No.: US09389180B2Publication Date: 2016-07-12
- Inventor: Francis C. Chilese , John R. Torczynski , Rudy Garcia , Leonard E. Klebanoff , Gildardo R. Delgado , Daniel J. Rader , Anthony S. Geller , Michail A. Gallis
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas US NM Albuquerque
- Assignee: KLA-Tencor Corporation,Sandia Corporation
- Current Assignee: KLA-Tencor Corporation,Sandia Corporation
- Current Assignee Address: US CA Milpitas US NM Albuquerque
- Agency: Simpson & Simpson, PLLC
- Main IPC: G01J1/42
- IPC: G01J1/42 ; G01N21/59 ; G03F7/20

Abstract:
An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.
Public/Granted literature
- US20140231659A1 METHODS AND APPARATUS FOR USE WITH EXTREME ULTRAVIOLET LIGHT HAVING CONTAMINATION PROTECTION Public/Granted day:2014-08-21
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