Invention Grant
- Patent Title: Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition
- Patent Title (中): 可聚合组合物，感光层，永久性图案，晶片级透镜，固态成像装置和图案形成方法
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Application No.: US14282141Application Date: 2014-05-20
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Publication No.: US09389507B2Publication Date: 2016-07-12
- Inventor: Kimi Ikeda , Yoshinori Tamada , Makoto Kubota
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2010-212886 20100922
- Main IPC: H01L27/00
- IPC: H01L27/00 ; G03F7/038 ; G02B13/00 ; G03F7/004 ; G03F7/029 ; G03F7/031 ; G03F7/033 ; G03F7/035 ; H01L27/146
Abstract:
A polymerizable composition contains (A) a polymerization initiator that is an acetophenone-based compound or an acylphosphine oxide-based compound, (B) a polymerizable compound, (C) at least either a tungsten compound or a metal boride, and (D) an alkali-soluble binder.
Public/Granted literature
Information query
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