Invention Grant
- Patent Title: Methods of making patterned structures of materials, patterned structures of materials, and methods of using same
- Patent Title (中): 制造材料的图案结构，材料的图案化结构及其使用方法的方法
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Application No.: US14005964Application Date: 2012-03-19
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Publication No.: US09389511B2Publication Date: 2016-07-12
- Inventor: Evan L. Schwartz , Wei Min Chan , Jin-Kyun Lee , Sandip Tiwari , Christopher K. Ober
- Applicant: Evan L. Schwartz , Wei Min Chan , Jin-Kyun Lee , Sandip Tiwari , Christopher K. Ober
- Applicant Address: US NY Ithaca
- Assignee: Cornell University
- Current Assignee: Cornell University
- Current Assignee Address: US NY Ithaca
- Agency: Hodgson Russ LLP
- International Application: PCT/US2012/029653 WO 20120319
- International Announcement: WO2012/129162 WO 20120927
- Main IPC: G03F7/26
- IPC: G03F7/26 ; G03F7/16 ; H01L21/027 ; B81C1/00 ; G03F7/038 ; G03F7/00
Abstract:
A method for forming patterns of organic polymer materials. The method can be used to form a layer with two patterned organic polymer materials. The photoresist and solvents used in the photoresist deposition and removal steps do not substantially affect the organic polymer materials.
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