Invention Grant
US09390926B2 Process sheet resistance uniformity improvement using multiple melt laser exposures
有权
使用多次熔融激光曝光处理薄层电阻均匀性提高
- Patent Title: Process sheet resistance uniformity improvement using multiple melt laser exposures
- Patent Title (中): 使用多次熔融激光曝光处理薄层电阻均匀性提高
-
Application No.: US14159228Application Date: 2014-01-20
-
Publication No.: US09390926B2Publication Date: 2016-07-12
- Inventor: Jiping Li , Aaron Muir Hunter , Bruce E. Adams , Kim Vellore , Samuel C. Howells , Stephen Moffatt
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/268 ; B23K26/00 ; B23K26/03 ; H01L21/20 ; H01L21/26 ; H01L21/36 ; H01L21/42 ; H01L21/44
Abstract:
Embodiments described herein relate to apparatus and methods of thermal processing. More specifically, apparatus and methods described herein relate to laser thermal treatment of semiconductor substrates by increasing the uniformity of energy distribution in an image at a surface of a substrate.
Public/Granted literature
- US20140256161A1 PROCESS SHEET RESISTANCE UNIFORMITY IMPROVEMENT USING MULTIPLE MELT LASER EXPOSURES Public/Granted day:2014-09-11
Information query
IPC分类:
