Invention Grant
US09395469B2 Methods for fabrication of stable ultra-low reflective surface and the ultra-low reflective surface itself 有权
用于制造稳定的超低反射表面和超低反射表面本身的方法

Methods for fabrication of stable ultra-low reflective surface and the ultra-low reflective surface itself
Abstract:
A method to prepare low reflective surface according to an example of the present invention comprises: the first step to prepare materials having pillar structure on the surface; the second step to prepare aluminum surface-materials by treating for the pillar structure to have aluminum surface; and the third step to prepare a low reflective surface with dual protuberance structure by forming nano-flake layer on the pillar surface of the material surface through oxidation of the surface aluminum of the aluminum surface-materials. The method to prepare low reflective surface can provide a low reflective surface structure that can be applied to photovoltaic device surface or various display surface as a surface able to reduce reflection significantly by absorbing wavelengths in the range of visible and infrared ray through internally total reflection with simple, low cost, and ecofriendly process.
Information query
Patent Agency Ranking
0/0