Invention Grant
- Patent Title: Methods for fabrication of stable ultra-low reflective surface and the ultra-low reflective surface itself
- Patent Title (中): 用于制造稳定的超低反射表面和超低反射表面本身的方法
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Application No.: US14260679Application Date: 2014-04-24
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Publication No.: US09395469B2Publication Date: 2016-07-19
- Inventor: Heon Ju Lee , Myoung Woon Moon , Kyu Hwan Oh , Seong Jin Kim , Eu Sun Yu , Tae Jun Ko , Seung Chul Kim
- Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Applicant Address: KR Seoul
- Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: KR Seoul
- Agency: Ladas & Parry LLP
- Priority: KR10-2013-0046220 20130425
- Main IPC: G02B1/11
- IPC: G02B1/11 ; B23H1/00 ; C23C14/30 ; G02B1/118 ; C23C14/02 ; C23C14/14 ; C23C14/58 ; B23H9/00

Abstract:
A method to prepare low reflective surface according to an example of the present invention comprises: the first step to prepare materials having pillar structure on the surface; the second step to prepare aluminum surface-materials by treating for the pillar structure to have aluminum surface; and the third step to prepare a low reflective surface with dual protuberance structure by forming nano-flake layer on the pillar surface of the material surface through oxidation of the surface aluminum of the aluminum surface-materials. The method to prepare low reflective surface can provide a low reflective surface structure that can be applied to photovoltaic device surface or various display surface as a surface able to reduce reflection significantly by absorbing wavelengths in the range of visible and infrared ray through internally total reflection with simple, low cost, and ecofriendly process.
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