Invention Grant
- Patent Title: Mask and method of fabricating spacers
- Patent Title (中): 掩模和制造间隔物的方法
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Application No.: US14416430Application Date: 2014-05-26
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Publication No.: US09395582B2Publication Date: 2016-07-19
- Inventor: Xiaochuan Chen , Hailin Xue , Chuncheng Che , Wenbo Jiang , Yue Li
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Beijing
- Assignee: BOE Technology Group Co., Ltd.,Beijing BOE Optoelectronics Technology Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.,Beijing BOE Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Beijing CN Beijing
- Agency: Collard & Roe, P.C.
- Priority: CN201310438678 20130924
- International Application: PCT/CN2014/078461 WO 20140526
- International Announcement: WO2015/043214 WO 20150402
- Main IPC: G02F1/1339
- IPC: G02F1/1339 ; G02B5/30 ; G03F7/20 ; G03F1/26 ; G02B5/00

Abstract:
A mask and a method of fabricating spacers (2) using the mask (1). The mask (1) comprises a light transmitting region including an array of light transmitting holes (230), a light non-transmitting region and a phase shifting layer (240) formed in one of two adjacent light transmitting holes (230) of the mask for shifting phrase of lights passing through the light transmitting holes (230). Thus, a light intensity can be reduced or lowered to zero when the lights pass through a diffractive region of the two adjacent light transmitting holes (230). Therefore, a bridging effect between two adjacent spacers (2) is alleviated and even avoided during fabricating the spacers (2).
Public/Granted literature
- US20150316797A1 MASK AND METHOD OF FABRICATING SPACERS Public/Granted day:2015-11-05
Information query
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