发明授权
- 专利标题: CMOS image sensor structure with crosstalk improvement
- 专利标题(中): 具有串扰改善的CMOS图像传感器结构
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申请号: US14583406申请日: 2014-12-26
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公开(公告)号: US09397130B1公开(公告)日: 2016-07-19
- 发明人: Chien-Chang Huang , Hsing-Chih Lin , Chien-Nan Tu , Yu-Lung Yeh
- 申请人: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 申请人地址: TW Hsinchu
- 专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Maschoff Brennan
- 主分类号: H01L27/146
- IPC分类号: H01L27/146
摘要:
A semiconductor device includes a substrate, a semiconductor layer, light-sensing devices, a transparent dielectric layer and a grid shielding layer. The semiconductor layer overlies the substrate, and has a first surface and a second surface opposite to the first surface. The semiconductor layer includes microstructures disposed on the second surface of the semiconductor layer. The light-sensing devices are disposed on the first surface of the semiconductor layer. The transparent dielectric layer is disposed on the second surface of the semiconductor layer, and covers the microstructures. The grid shielding layer extends from the first surface of the semiconductor layer toward the second surface of the semiconductor layer, and surrounds each of the light-sensing devices to separate the light-sensing devices from each other, in which a depth of the grid shielding layer is greater than two-thirds of a thickness of the semiconductor layer.
公开/授权文献
- US20160190191A1 CMOS IMAGE SENSOR STRUCTURE WITH CROSSTALK IMPROVEMENT 公开/授权日:2016-06-30
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