Invention Grant
- Patent Title: Heterojunction bipolar transistor with two base layers
- Patent Title (中): 具有两个基极层的异质结双极晶体管
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Application No.: US14848090Application Date: 2015-09-08
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Publication No.: US09397204B2Publication Date: 2016-07-19
- Inventor: Isao Obu , Yasunari Umemoto , Atsushi Kurokawa
- Applicant: MURATA MANUFACTURING CO., LTD.
- Applicant Address: JP Kyoto-fu
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Kyoto-fu
- Agency: Studebaker & Brackett PC
- Priority: JP2013-056259 20130319
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L29/66 ; H01L29/737 ; H01L29/10 ; H01L29/08 ; H01L29/205 ; H01L29/417

Abstract:
A heterojunction bipolar transistor includes a collector layer composed of a semiconductor containing GaAs as a main component; a base layer including a first base layer and a second base layer the first base layer forming a heterojunction with the collector layer and being composed of a semiconductor containing a material as a main component, the material being lattice-mismatched to the main component of the collector layer, the first base layer having a film thickness less than a critical thickness at which a misfit dislocation is introduced, the second base layer being joined to the first base layer and composed of a semiconductor containing a material as a main component, and the material being lattice-matched to the main component of the collector layer; and an emitter layer that forms a heterojunction with the second base layer.
Public/Granted literature
- US20160005841A1 HETEROJUNCTION BIPOLAR TRANSISTOR Public/Granted day:2016-01-07
Information query
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