Invention Grant
- Patent Title: Extreme ultraviolet light generation system
- Patent Title (中): 极紫外光发生系统
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Application No.: US14724737Application Date: 2015-05-28
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Publication No.: US09402297B2Publication Date: 2016-07-26
- Inventor: Osamu Wakabayashi , Tatsuya Yanagida , Hakaru Mizoguchi
- Applicant: GIGAPHOTON INC.
- Applicant Address: JP Tochigi
- Assignee: GIGAPHOTON INC.
- Current Assignee: GIGAPHOTON INC.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Priority: JP2010-074256 20100329; JP2010-265791 20101129; JP2011-015695 20110127; JP2011-058026 20110316; JP2011-133112 20110615; JP2011-201750 20110915; JP2012-103580 20120427; JP2012-141079 20120622
- Main IPC: H05G2/00
- IPC: H05G2/00
Abstract:
An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.
Public/Granted literature
- US20150264793A1 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM Public/Granted day:2015-09-17
Information query
